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Figure 5
(a, b) Line patterns of Au/Ag obtained using a sectioned multilayer mask with 680 nm period for 30 min and 90 min exposure, respectively. (c) Lines of Au/Ag NPs fabricated by exposing an Au/Ag film grown on a stepped sapphire to X-rays for 30 min without using a mask. The metal particles aggregated to the step edges to form a line pattern.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 22| Part 1| January 2015| Pages 156-160
https://doi.org/10.1107/S1600577514023534
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