view article
Figure 1
Schematic of an interference lithography setup using a binary grating mask. The first-order (m = ±1) beams form an aerial image at the image plane, a distance z1 from the mask, which is then transferred onto a photoresist. The zero-order (m = 0) and second-order (m = 2) diffracted beams are also shown.

Journal logoJOURNAL OF
SYNCHROTRON
RADIATION
ISSN: 1600-5775
Volume 31| Part 3| May 2024| Pages 485-492
https://doi.org/10.1107/S1600577524002534
Follow J. Synchrotron Rad.
Sign up for e-alerts
E-alerts
Follow J. Synchrotron Rad. on Twitter
Twitter
Follow us on facebook
Facebook
Sign up for RSS feeds
RSS